プラズマイオン注入法を用いた薄膜形成、および表面処理

URI http://harp.lib.hiroshima-u.ac.jp/it-hiroshima/metadata/12427
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Title
プラズマイオン注入法を用いた薄膜形成、および表面処理
Title Alternative
Thin film formation and surface treatment using plasma ion implantation method
Author
氏名 田中 武
ヨミ タナカ タケシ
別名 Takeshi TANAKA
Subject
plasma based ion implantation, plasma density, oxygen, nitrogen
Abstract

 In the PBII method, the ion density in the sheath could be obtained based on the modulator equivalent circuit. In the PBII method, the self-ignitting plasma used in the sterilization process was formed, and the plasma density and sheath length could be calculated from the obtained discharge current-high voltage voltage waveform. Using this method, some of the important parameters such as plasma density and sheath length could be obtained when designing the equipment in the future.

Journal Title
広島工業大学紀要. 研究編
Volume
56
Spage
145
Epage
154
Published Date
2022-03
Publisher
広島工業大学
ISSN
1346-9975
NCID
AA11599110
Language
jpn
NIIType
Departmental Bulletin Paper
Text Version
Rights
publisher
Set
it-hiroshima