プラズマイオン注入法を用いた薄膜形成、および表面処理
URI | http://harp.lib.hiroshima-u.ac.jp/it-hiroshima/metadata/12427 | ||||||
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File |
research56_145-154.pdf
( 2.0 MB )
Open Date
:2022-04-18
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Title |
プラズマイオン注入法を用いた薄膜形成、および表面処理
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Title Alternative |
Thin film formation and surface treatment using plasma ion implantation method
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Author |
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Subject |
plasma based ion implantation, plasma density, oxygen, nitrogen
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Abstract |
In the PBII method, the ion density in the sheath could be obtained based on the modulator equivalent circuit. In the PBII method, the self-ignitting plasma used in the sterilization process was formed, and the plasma density and sheath length could be calculated from the obtained discharge current-high voltage voltage waveform. Using this method, some of the important parameters such as plasma density and sheath length could be obtained when designing the equipment in the future. |
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Journal Title |
広島工業大学紀要. 研究編
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Volume |
56
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Spage |
145
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Epage |
154
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Published Date |
2022-03
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Publisher |
広島工業大学
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ISSN |
1346-9975
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NCID |
AA11599110
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Language |
jpn
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NIIType |
Departmental Bulletin Paper
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Text Version | |||||||
Rights |
publisher
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Set |
it-hiroshima
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