広島工業大学におけるクリ-ンル-ムの維持および管理
URI | http://harp.lib.hiroshima-u.ac.jp/it-hiroshima/metadata/4261 | ||||||||||||
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File |
kenkyukiyo26161.pdf
( 266.0 KB )
Open Date
:2009-08-17
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Title |
広島工業大学におけるクリ-ンル-ムの維持および管理
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Title Alternative |
Maintenance and Control of Clean Room Equipped for Electronics Education in the Hiroshima Institute of Technology
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Author |
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Subject |
Clean Room Maintenace of the Clean Room
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Abstract |
The microelectronics industry in Japan has grown rapidly in recent years. In general, all steps in the semiconductor process are implemented in a clean room. The air in the clean room is maintained at a well-controlled temperature and is continuously filtered and recirculated. Also the air in the clean room is monitored and classified with respect to particulates. A “class 1000” environment has a maximum of 1000 partic1es per cubic foot with particle size larger than 0.5 μm. Five years have passed since the clean rooms of class 1000 and 10000 in the Department of Electronics, Hiroshima Institute of Technology was established in 1986. An outline and the know-how on the maintenance of the clean room is described. |
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Journal Title |
広島工業大学研究紀要
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Volume |
26
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Spage |
161
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Epage |
168
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Published Date |
1992
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Publisher |
広島工業大学
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ISSN |
03851672
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NCID |
AN0021271X
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Language |
jpn
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NIIType |
Departmental Bulletin Paper
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Text Version |
出版社版
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Old URI | |||||||||||||
Set |
it-hiroshima
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