広島工業大学におけるクリ-ンル-ムの維持および管理

URI http://harp.lib.hiroshima-u.ac.jp/it-hiroshima/metadata/4261
File
Title
広島工業大学におけるクリ-ンル-ムの維持および管理
Title Alternative
Maintenance and Control of Clean Room Equipped for Electronics Education in the Hiroshima Institute of Technology
Author
氏名 田中 武
ヨミ タナカ タケシ
別名 Tanaka Takeshi
氏名 川畑 敬志
ヨミ カワバタ ケイシ
別名 Kawabata Keishi
Subject
Clean Room Maintenace of the Clean Room
Abstract

The microelectronics industry in Japan has grown rapidly in recent years. In general, all steps in the semiconductor process are implemented in a clean room. The air in the clean room is maintained at a well-controlled temperature and is continuously filtered and recirculated. Also the air in the clean room is monitored and classified with respect to particulates. A “class 1000” environment has a maximum of 1000 partic1es per cubic foot with particle size larger than 0.5 μm. Five years have passed since the clean rooms of class 1000 and 10000 in the Department of Electronics, Hiroshima Institute of Technology was established in 1986. An outline and the know-how on the maintenance of the clean room is described.

Journal Title
広島工業大学研究紀要
Volume
26
Spage
161
Epage
168
Published Date
1992
Publisher
広島工業大学
ISSN
03851672
NCID
AN0021271X
Language
jpn
NIIType
Departmental Bulletin Paper
Text Version
出版社版
Old URI
Set
it-hiroshima