広島工業大学におけるクリ-ンル-ムの維持および管理
URI | http://harp.lib.hiroshima-u.ac.jp/it-hiroshima/metadata/4261 | ||||||||||||
---|---|---|---|---|---|---|---|---|---|---|---|---|---|
ファイル |
kenkyukiyo26161.pdf
( 266.0 KB )
公開日
:2009-08-17
|
||||||||||||
タイトル |
広島工業大学におけるクリ-ンル-ムの維持および管理
|
||||||||||||
別タイトル |
Maintenance and Control of Clean Room Equipped for Electronics Education in the Hiroshima Institute of Technology
|
||||||||||||
著者 |
|
||||||||||||
キーワード |
Clean Room Maintenace of the Clean Room
|
||||||||||||
抄録 |
The microelectronics industry in Japan has grown rapidly in recent years. In general, all steps in the semiconductor process are implemented in a clean room. The air in the clean room is maintained at a well-controlled temperature and is continuously filtered and recirculated. Also the air in the clean room is monitored and classified with respect to particulates. A “class 1000” environment has a maximum of 1000 partic1es per cubic foot with particle size larger than 0.5 μm. Five years have passed since the clean rooms of class 1000 and 10000 in the Department of Electronics, Hiroshima Institute of Technology was established in 1986. An outline and the know-how on the maintenance of the clean room is described. |
||||||||||||
掲載雑誌名 |
広島工業大学研究紀要
|
||||||||||||
巻 |
26
|
||||||||||||
開始ページ |
161
|
||||||||||||
終了ページ |
168
|
||||||||||||
出版年月日 |
1992
|
||||||||||||
出版者 |
広島工業大学
|
||||||||||||
ISSN |
03851672
|
||||||||||||
NCID |
AN0021271X
|
||||||||||||
本文言語 |
日本語
|
||||||||||||
資料タイプ |
紀要論文
|
||||||||||||
著者版フラグ |
出版社版
|
||||||||||||
旧URI | |||||||||||||
区分 |
it-hiroshima
|